Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing photomask, method for producing semiconductor device, method for forming pattern, and photomask

Method for producing photomask, method for producing semiconductor device, method for forming pattern, and photomask

US Patent 11275305 · Granted Mar 15, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pattern forming method, combined processing apparatus, and recording medium2025
Semiconductor device, template, and method of manufacturing template2024
Template, manufacturing method of template2023
Substrate processing method and substrate processing apparatus2023
Processing apparatus for processing substrates of different types2023
Pattern inspection method and photomask fabrication method2023
Substrate processing method and substrate processing apparatus2022
Exposure mask and manufacturing method of same2022
Substrate processing method, substrate processing apparatus, and composite proce2021
Substrate processing method, substrate processing apparatus, and composite proce2021
Reflection-type exposure mask2020
EUV mask and method for manufacturing same2018