Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma etching method for selectively etching silicon oxide with respect to silicon nitride

Plasma etching method for selectively etching silicon oxide with respect to silicon nitride

US Patent 11264246 · Granted Mar 1, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for etching a semiconductor substrate in a plasma etch cham2025
Sheet feeding apparatus and recording apparatus2025
Etching apparatus2025
Etching apparatus2025
Display mounting device2025
Recording apparatus2024
Method for separating semiconducting carbon nanotubes, and mixed solution, and d2024
Maintenance apparatus, recording apparatus, and control method2023
Array antenna apparatus and method for manufacturing array antenna apparatus2023
Etching method2022
Laser peening device and laser peening method2022
Methods and apparatus for in-situ protection liners for high aspect ratio reacti2022