Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for manufacturing sputtering target, method for forming oxide film, and transistor

Method for manufacturing sputtering target, method for forming oxide film, and transistor

US Patent 11139166 · Granted Oct 5, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device with an oxide semiconductor having a plurality of openings2025
Display device2025
Optical sensor device2025
Semiconductor device2025
Semiconductor device having light-emitting element2025
Semiconductor device2025
Semiconductor device2025
Semiconductor device2025
Semiconductor device2025
Semiconductor device2025
Semiconductor device and electronic device having stacked element layers on driv2025
Imaging device2025