Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods of fabricating semiconductor devices using MOS transistors with nonuniform gate electrode structures

Methods of fabricating semiconductor devices using MOS transistors with nonuniform gate electrode structures

US Patent 11127739 · Granted Sep 21, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Display device2025
Semiconductor devices2025
Dock shelter module provided with dual gate and air curtain2025
Asymmetrical sealing and gas flow control device2024
Semiconductor device and method for fabricating the same2024
Semiconductor device2024
Display device and method for driving pixel of the same2024
Semiconductor devices with nanowires and methods for fabricating the same2024
Semiconductor devices with nanowires and methods for fabricating the same2024
Semiconductor device including work function adjusting metal gate structure2024
Method of forming an integrated circuit device having a contact capping layer2024
Semiconductor device2024