Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor devices formed using multiple planarization processes

Semiconductor devices formed using multiple planarization processes

US Patent 11121028 · Granted Sep 14, 2021

Estimated economic value: $13,316,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device cleaning solution, method of use, and method of manufacture2025
Semiconductor device cleaning solution, method of use, and method of manufacture2025
Chemical-mechanical planarization pad and methods of use2025
Composition and method for polishing and integrated circuit2025
Composition and method for polishing and integrated circuit2025
Composition and method for polishing and integrated circuit2025
Composition and method for polishing and integrated circuit2025
In-situ defect count detection in post chemical mechanical polishing2025
In-situ defect count detection in post chemical mechanical polishing2025
Chemical mechanical polishing apparatus and method2025
Integrated circuit photodetector2025
System and method for removing debris during chemical mechanical planarization2025