Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Processing system and method of forming a contact

Processing system and method of forming a contact

US Patent 11114320 · Granted Sep 7, 2021

Estimated economic value: $49,370,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Doped polar layers and semiconductor device incorporating same2025
Molybdenum monolithic physical vapor deposition target2025
Methods and apparatus for enhancing selectivity of titanium and titanium silicid2025
Methods and apparatus for enhancing selectivity of titanium and titanium silicid2025
Methods and apparatus for enhancing selectivity of titanium and titanium silicid2025
Ru liner above a barrier layer2025
Multi color stack for self aligned dual pattern formation for multi purpose devi2025
Doped polar layers and semiconductor device incorporating same2025
Camera with folded optics having moveable lens2025
Electrical contact cavity structure and methods of forming the same2025
System and method for radical and thermal processing of substrates2025
Methods for controlling contact resistance in cobalt-titanium structures2025