Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of manufacturing semiconductor device and method of cleaning substrate

Method of manufacturing semiconductor device and method of cleaning substrate

US Patent 11107672 · Granted Aug 31, 2021

Estimated economic value: $13,167,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for forming a semiconductor structure using dehydrating chemical, and met2025
Semiconductor structure etching solution and method for fabricating a semiconduc2025
Fin field-effect transistor and method of forming the same2025
Semiconductor device and manufacturing method thereof2024
Fin field-effect transistor and method of forming the same2024
Semiconductor structure etching solution and method for fabricating a semiconduc2023
Storage device and storage device management method2023
Apparatus and method for generating an electromagnetic radiation2021
Semiconductor structure etching solution and method for fabricating a semiconduc2021
Method for forming a semiconductor structure using dehydrating chemical, and met2021
Method for dehydrating semiconductor structure and dehydrating method of the sam2021
Method for drying wafer with gaseous fluid2021