Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography

Device for determining the exposure energy during the exposure of an element in an optical system, in particular for microlithography

US Patent 11079604 · Granted Aug 3, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for characterizing a microlithographic mask2023
Device and method for characterizing a microlithographic mask2021
Module2021
Powercore module2021
Anti-evaporation cap cover for towelette dispenser container and assembly2021
Module2021
Seat cushion assembly with pocket2021
Powercore module2020
Method and device for characterizing a mask for microlithography2020
Anti-evaporation cap cover for towelette dispenser container and assembly2020
Illumination optical unit for a metrology system and metrology system comprising2020
Illumination optical unit for a metrology system and metrology system comprising2019