Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and systems for controlling wafer fabrication process

Methods and systems for controlling wafer fabrication process

US Patent 11056405 · Granted Jul 6, 2021

Estimated economic value: $186,056,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of etch model calibration using optical scatterometry2023
Systems and methods for calibrating scalar field contribution values for a limit2021
Systems and methods for performing edge ring characterization2021
Method of etch model calibration using optical scatterometry2021
System and method for determining field non-uniformities of a wafer processing c2020
Method of etch model calibration using optical scatterometry2020
Systems and methods for calibrating scalar field contribution values for a limit2019
Systems and methods for aligning measurement device in substrate processing syst2019