{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Large area high resolution feature reduction lithography technique", "item": "https://www.patentleaderboard.com/patent/11042098"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Large area high resolution feature reduction lithography technique

Large area high resolution feature reduction lithography technique

US Patent 11042098 · Granted Jun 22, 2021

Estimated economic value: $66,836,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Flexible multi-layered cover lens stacks for foldable displays2025
Flexible multi-layered cover lens stacks for foldable displays2025
Bowed substrate clamping method, apparatus, and system2025
Large area seamless master and imprint stamp manufacturing method2024
Flexible multi-layered cover lens stacks for foldable displays2024
Flexible multi-layered cover lens stacks for foldable displays2024
Flexible multi-layered cover lens stacks for foldable displays2024
Large area self imaging lithography based on broadband light source2023
Flexible multi-layered cover lens stacks for foldable displays2023
Large area self imaging lithography based on broadband light source2021
3D displays2020