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Home › Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets

Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets

US Patent 11022897 · Granted Jun 1, 2021

Estimated economic value: $41,772,000 ⓘ

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