Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High-current ion implanter and method for controlling ion beam using high-current ion implanter

High-current ion implanter and method for controlling ion beam using high-current ion implanter

US Patent 11011343 · Granted May 18, 2021

Estimated economic value: $51,490,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Retractable composite bumper step assist and storage compartment2025
Ion extraction optics having non uniform grid assembly2025
Ion extraction optics having novel blocker configuration2025
Particle accelerator having novel electrode configuration for quadrupole focusin2025
Model-based controlled load lock pumping scheme2025
Linear accelerator assembly including flexible high-voltage connection2025
Plasma shaper to control ion flux distribution of plasma source2025
Cover ring to mitigate carbon contamination in plasma doping chamber2024
Device to control uniformity of extracted ion beam2024
Single-slot tubular cathode2024
Single-slot tubular cathode2024
Resonator, linear accelerator configuration and ion implantation system having r2024