Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Measurement system, lithographic apparatus and device manufacturing method

Measurement system, lithographic apparatus and device manufacturing method

US Patent 11009800 · Granted May 18, 2021

Estimated economic value: $75,541,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Measurement system and method for characterizing a patterning device2025
Temperature conditioning system, a lithographic apparatus and a method of temper2025
Manufacturing a reflective diffraction grating2024
Metrology measurement method and apparatus2024
Radiation system2024
Contaminant detection metrology system, lithographic apparatus, and methods ther2023
Lithographic apparatus2023
Substrate holder, a lithographic apparatus and method of manufacturing devices2023
Method and apparatus for determining a radiation beam intensity profile2022
Apparatus incorporating a gas lock2022
Lithographic apparatus and device manufacturing method2022
Particle traps and barriers for particle suppression2021