Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Deposition of molybdenum thin films using a molybdenum carbonyl precursor

Deposition of molybdenum thin films using a molybdenum carbonyl precursor

US Patent 10995405 · Granted May 4, 2021

Estimated economic value: $204,878,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photosensitive material and method of forming patterned structures2025
Selective passivation and selective deposition2025
Simultaneous selective deposition of two different materials on two different su2025
Methods for depositing carbon conducting films by atomic layer deposition2025
Selective deposition of organic material2025
Multiple-layer method and system for forming material within a gap2025
Methods of forming molybdenum-containing films deposited on elemental metal film2025
Methods and systems for forming a layer comprising vanadium and oxygen2025
Structures with boron- and gallium-doped silicon germanium layers and methods an2025
Transition metal nitride deposition method2025
Methods and systems for filling a gap2025
Etch process and a processing assembly2025