Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Modifying material parameters of a nanoscale device post-fabrication

Modifying material parameters of a nanoscale device post-fabrication

US Patent 10957853 · Granted Mar 23, 2021

Estimated economic value: $2,115,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photonic content-addressable memory and applications thereof2025
Conductance modulation in computational memory2025
Solving optimization problems with photonic crossbars2025
Programming elements onto a computational memory2025
Compensating non-ideality of a neuromorphic memory device2025
Memory mapping of activations for convolutional neural network executions2025
Accurate programming of analog memory devices of in-memory processing devices ha2025
Memory-augmented neural network system2024
Resistive memory device for matrix-vector multiplications2024
Processing data in-memory with memory devices having a crossbar array structure2024
Processing data in-memory with memory devices having a crossbar array structure2024
Processing data in-memory with memory devices having a crossbar array structure2024