Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › CVD reactor chamber with resistive heating for silicon carbide deposition

CVD reactor chamber with resistive heating for silicon carbide deposition

US Patent 10947640 · Granted Mar 16, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Inclusion of special roller to avoid creasing, wrinkling and distortion of flexi2025
Evaporator for effective surface area evaporation2025
Rotary reactor for uniform particle coating with thin films2025
Semiconductor exfoliation method2025
Method and apparatus for laser drilling blind vias2025
Wide band gap semiconductor process, device, and method2025
Pulsed DC power for deposition of film2025
Physical vapor deposition of piezoelectric films2025
Cleaning materials and processes for lithium processing equipment2024
Integrated method for low-cost wide band gap semiconductor device manufacturing2024
Laser dicing glass wafers using advanced laser sources2024
Apparatus for fiber optic temperature probe in processing chambers2024