Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Metrology system for substrate deformation measurement

Metrology system for substrate deformation measurement

US Patent 10923371 · Granted Feb 16, 2021

Estimated economic value: $36,444,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

End effector2025
In-situ reflectometry for real-time process control2025
Time delay integration acquisition for spatial genomics imaging2025
Automated closed system for cell therapy manufacturing2025
Subsurface alignment metrology system for packaging applications2025
Adaptive control of variability in device performance in advanced semiconductor 2025
Image based metrology of surface deformations2025
System and method to map thickness variations of substrates in manufacturing sys2025
System and method to map thickness variations of substrates in manufacturing sys2025
Autonomous substrate processing system2025
Metrology system for packaging applications2025
In-line monitoring of OLED layer thickness and dopant concentration2025