Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Rate enhanced pulsed DC sputtering system

Rate enhanced pulsed DC sputtering system

US Patent 10910203 · Granted Feb 2, 2021

Estimated economic value: $49,155,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Rate enhanced pulsed DC sputtering system2025
Apparatus, system and method to reduce crazing2024
Rate enhanced pulsed DC sputtering system2017
Method of preparing adherent/coherent amorphous fluorocarbon coatings1999