Removal apparatus for removing residual gas and substrate treating facility including the same

Assignee

• Samsung

Inventors

• Heokjae Lee (1 patents)
• Hahn Park (2 patents)
• Jae Boo Kim (2 patents)
• Dongil Yoon (1 patents)
• MinYoung Hwang (1 patents)
• Se Un Park (2 patents)
• Kang Min Park (11 patents)
• Yongjoon Hong (1 patents)
• Sung Baek Kim (1 patents)
• Woo-Jin Park (75 patents)

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