Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System for cleaning wafer in CMP process of semiconductor manufacturing fabrication

System for cleaning wafer in CMP process of semiconductor manufacturing fabrication

US Patent 10864557 · Granted Dec 15, 2020

Estimated economic value: $3,031,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemical mechanical polishing apparatus and method2025
Chemical mechanical polishing apparatus and method2025
Platen rotation device2024
Sputter target magnet2024
Chemical-mechanical polishing system and method2023
System for cleaning wafer in CMP process of semiconductor manufacturing fabricat2022
System for cleaning wafer in CMP process of semiconductor manufacturing fabricat2022
Sputter target magnet2022
Platen rotation method2021
Platen rotation system and method2020
Method and system for cleansing wafer in CMP process of semiconductor manufactur2017
Method and system for cleansing wafer in CMP process of semiconductor manufactur2017