Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of etching at low temperature and plasma etching apparatus

Method of etching at low temperature and plasma etching apparatus

US Patent 10818503 · Granted Oct 27, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of measuring parameters of plasma, apparatus for measuring parameters of 2025
Substrate processing apparatus and method of manufacturing semiconductor device 2024
Plasma processing apparatus and method of manufacturing semiconductor device usi2024
Plasma processing apparatus and semiconductor device manufacturing method using 2024
Gas supply assembly and substrate processing apparatus including the same2022
Plasma processing apparatus2022
Detecting and compensating for pressure deviations affecting audio transducers2019
Acoustic parameter adjustment2018
Mobile terminal and manufacturing method for heat spreader module2018
Watch type mobile terminal2017
Mobile terminal and manufacturing method for heat spreader module2017