Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning

Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning

US Patent 10712677 · Granted Jul 14, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for maintaining a projection exposure apparatus, service module and arran2025
Methods, systems and computer readable mediums for evaluating and displaying a b2025
Projection exposure apparatus having a device for determining the concentration 2025
Projection exposure apparatus having a device for determining the concentration 2025
Method for operating an EUV lithography apparatus, and EUV lithography apparatus2025
Method for operating an EUV lithography apparatus, and EUV lithography apparatus2025
Method for avoiding a degradation of an optical element, projection system, illu2024
Stator for an electric machine having insulation paper for a stator winding2024
Polymers for the treatment of surfaces2024
Container-processing system and method having safety-oriented management of sett2023
System and method for autonomous mapping of enterprise identity2022
Method for operating an optical apparatus, and optical apparatus2022