Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Block copolymer materials containing polyhedral oligomeric silsesquioxane(POSS)

Block copolymer materials containing polyhedral oligomeric silsesquioxane(POSS)

US Patent 10703858 · Granted Jul 7, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Material surface reforming apparatus using ion implantation2025
Light emitting device2025
Wind power generation system using moving body2025
Luggage2025
Printing apparatus and providing method thereof2025
Method and apparatus for printing electrical circuit directly on target surface 2025
Electric vehicle charging system using vehicle elevator device for vertical park2025
Light emitting package free of wavelength conversion material2025
Tissue dispenser2024
Fuel cell vehicle2024
Fuel cell vehicle2024
Substrate transfer robot for transferring substrate in vacuum chamber2024