Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gate feature in finFET device

Gate feature in finFET device

US Patent 10665686 · Granted May 26, 2020

Estimated economic value: $4,864,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Ultra-thin fin structure and method of fabricating the same2025
Semiconductor devices with counter-doped nanostructures2025
Source/drain structure with enhanced dopant diffusion for semiconductor device2025
Semiconductor devices having parasitic channel structures2025
Semiconductor structure with embedded memory device2025
Semiconductor device and method of manufacturing a semiconductor device2024
Devices with adjusted fin profile and methods for manufacturing devices with adj2024
Isolation structures for semiconductor devices2024
Semiconductor devices including channel regions having non-uniform Ge concentrat2024
Moiré pattern imaging device2024
Source/drain structure for semiconductor device2024
Source/drain structure for semiconductor device2024