Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mirror arrangement for microlithographic projection exposure apparatus and related method

Mirror arrangement for microlithographic projection exposure apparatus and related method

US Patent 10663873 · Granted May 26, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Projection exposure apparatus for semiconductor lithography with reduce thermal 2020
Diaphragm changing device2018
Optical component2018
Optical element2017
Optical aperture device2016
Optical element unit and method of supporting an optical element2015
Optical aperture device2014
Optical assembly2013
Optical module with minimized overrun of the optical element2013
Connecting arrangement for an optical device2012
Diaphragm changing device2012
Optical imaging device having at least one system diaphragm2011