Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Imprint system and imprinting process with spatially non-uniform illumination

Imprint system and imprinting process with spatially non-uniform illumination

US Patent 10663869 · Granted May 26, 2020

Estimated economic value: $28,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Planarization system and method2025
Method of cleaning fluid dispenser by applying suction force and vibrating menis2025
Superstrate including a body and layers and methods of forming and using the sam2025
Superstrate and a method of using the same2025
Frame curing system for extrusion control2024
Method of forming a photo-cured layer2024
Imprint lithography methods comprising multiple printheads configured to generat2024
Shaping system including an evaporation cover, shaping process, and method of ma2024
Method and system for adjusting edge positions of a drop pattern2023
Fluid droplet methodology and apparatus for imprint lithography2023
Curing a shaped film using multiple images of a spatial light modulator2023
Systems and methods for reducing pressure while shaping a film2023