Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multiple-mask multiple-exposure lithography and masks

Multiple-mask multiple-exposure lithography and masks

US Patent 10620530 · Granted Apr 14, 2020

Estimated economic value: $9,665,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical probe with high stability for measurement of radiation information of tu2025
Semiconductor device and method of manufacture2025
Seamless bonding layers in semiconductor packages and methods of forming the sam2025
Integrated circuit packages and methods of forming the same2025
Method of manufacturing integrated circuit having through-substrate via2025
Integrated circuit packages and methods of forming the same2024
System and method for aligned stitching2024
Integrating passive devices in package structures2024
Through-dielectric vias for direct connection and method forming same2024
Semiconductor package and manufacturing method thereof2024
Manufacturing method of semiconductor structure2024
Multiple-mask multiple-exposure lithography and masks2024