Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pseudo defect sample, process for producing the same, method for adjusting ultrasonic flaw detection measurement condition, method for inspecting target material, and process for producing sputtering target

Pseudo defect sample, process for producing the same, method for adjusting ultrasonic flaw detection measurement condition, method for inspecting target material, and process for producing sputtering target

US Patent 10564134 · Granted Feb 18, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Information processing system, information processing method, and recording medi2025
Sputtering target, method of bonding target material and backing plate, and meth2025
Backing plate, sputtering target, and production methods therefor2024
Sputtering target, method of bonding target material and backing plate, and meth2024
Method for machining sputtering target, apparatus for machining sputtering targe2023
Method for manufacturing sputtering target and sputtering target2023
Sputtering target packaging structure and method of packaging sputtering target2022
Sputtering target2021
Cylindrical target production method and cylindrical target2020
Air-conditioning apparatus2019
Air-conditioning apparatus2019
Air-conditioning apparatus2018