Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cut last self-aligned litho-etch patterning

Cut last self-aligned litho-etch patterning

US Patent 10553431 · Granted Feb 4, 2020

Estimated economic value: $8,353,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Fin field-effect transistor device and method2025
Method of breaking through etch stop layer2025
Semiconductor devices and methods of manufacture2025
Etching to reduce line wiggling2025
Automatic camera calibration2025
Semiconductor device with self-aligned vias2025
Faucet2025
Semiconductor device and method2025
Integrated circuit and method for manufacturing the same2024
Air spacer surrounding conductive features and method forming same2024
Security ecosystem, device and method for communicating with communication devic2024
System and method for summarization of search results2024