{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Technologies for inverting lithographic patterns and semiconductor devices including high aspect ratio structures", "item": "https://www.patentleaderboard.com/patent/10553430"}]}
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Home › Technologies for inverting lithographic patterns and semiconductor devices including high aspect ratio structures

Technologies for inverting lithographic patterns and semiconductor devices including high aspect ratio structures

US Patent 10553430 · Granted Feb 4, 2020

Estimated economic value: $21,361,000 ⓘ

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