Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Copper alloy sputtering target and method for manufacturing same

Copper alloy sputtering target and method for manufacturing same

US Patent 10494712 · Granted Dec 3, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sputtering target and manufacturing method therefor2025
Sputtering target and manufacturing method therefor2025
Sputtering target and manufacturing method therefor2023
Sputtering target and manufacturing method therefor2023
Sputtering target and production method therefor2022
High-purity copper-chromium alloy sputtering target2019
Copper alloy sputtering target2019
High-purity copper-cobalt alloy sputtering target2018
High-purity copper sputtering target2017
Sputtering target and manufacturing method therefor2017
Lanthanum target for sputtering2016
Lanthanum target for sputtering2016