Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System for rapid bake of semiconductor substrate with upper linear heating elements perpendicular to horizontal gas flow

System for rapid bake of semiconductor substrate with upper linear heating elements perpendicular to horizontal gas flow

US Patent 10480095 · Granted Nov 19, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus for adjusting a pedestal assembly for a reactor2021
Gas supply manifold and method of supplying gases to chamber using same2020
Apparatus and method for adjusting a pedestal assembly for a reactor2019
Rapid bake of semiconductor substrate with upper linear heating elements perpend2018
Rapid bake of semiconductor substrate with upper linear heating elements perpend2018
Chamber sealing member2016
Susceptor heater and method of heating a substrate2016
Susceptor heater shim2015
Radiation shielding for a substrate holder2015
Chamber sealing member2015
Susceptor heater and method of heating a substrate2015
Vacuum flange ring2014