Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Manufacturing method for semiconductor device having an oxidation-resistant insulating film in a termination region

Manufacturing method for semiconductor device having an oxidation-resistant insulating film in a termination region

US Patent 10468496 · Granted Nov 5, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Drill for carbon-fiber composite material2025
Manufacturing method of semiconductor device and semiconductor device2023
Manufacturing method of semiconductor device and semiconductor device2023
Drill2022
Semiconductor device2022
Shearing member and filtration device2021
Semiconductor device2021
Semiconductor device2020
Manufacturing method of semiconductor device and semiconductor device2020
Manufacturing method of semiconductor device and semiconductor device2020
Magnetic resonance imaging apparatus and SAR prediction method2020
Heat-sealing device and filling-packing machine provided therewith2019