Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Flourination process to create sacrificial oxy-flouride layer

Flourination process to create sacrificial oxy-flouride layer

US Patent 10443125 · Granted Oct 15, 2019

Estimated economic value: $25,920,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Halogen resistant coatings and methods of making and using thereof2025
Protective metal oxy-fluoride coatings2025
Protective metal oxy-fluoride coatings2025
Atomic layer deposition coating system for inner walls of gas lines2025
Methods of operating a spatial deposition tool2025
Atomic layer deposition coatings for high temperature ceramic components2025
Atomic layer deposition coatings for high temperature ceramic components2025
Mainframe of dual-robot substrate processing system2025
Plasma chamber with multiphase rotating independent gas cross-flow with reduced 2025
Cuttings trap for “at bit” measurement of drilled cuttings2025
Parallel atomic layer deposition of target element interiors2025
Hafnium aluminum oxide coatings deposited by atomic layer deposition2025