Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › FinFET cut isolation opening revision to compensate for overlay inaccuracy

FinFET cut isolation opening revision to compensate for overlay inaccuracy

US Patent 10423078 · Granted Sep 24, 2019

Estimated economic value: $65,614,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Gap fill void and connection structures2023
SRAM bit cells formed with dummy structures2021
SRAM bit cells formed with dummy structures2021
Fin-based anti-fuse device for integrated circuit (IC) products, methods of maki2021
Fin-based anti-fuse device for integrated circuit (IC) products, methods of maki2021
Gap fill void and connection structures2021
STI structure with liner along lower portion of longitudinal sides of active reg2021
Interconnects separated by a dielectric region formed using removable sacrificia2021
Anti-fuse for an integrated circuit (IC) product and method of making such an an2021
Anti-fuse for an integrated circuit (IC) product and method of making such an an2021
Double pass diluted ultraviolet reticle inspection2020
Device/health of line (HOL) aware eBeam based overlay (EBO OVL) structure2020