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Home › Method of localized modification of the stresses in a substrate of the SOI type, in particular FD SOI type, and corresponding device

Method of localized modification of the stresses in a substrate of the SOI type, in particular FD SOI type, and corresponding device

US Patent 10381478 · Granted Aug 13, 2019

Estimated economic value: $9,789,000 ⓘ

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