Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputtering target and method for producing same

Sputtering target and method for producing same

US Patent 10351946 · Granted Jul 16, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Performance evaluation method, operation control method, performance evaluation 2025
Printing inspection device2022
Sputtering target material2022
Powder magnetic core with silica-based insulating film, method of producing the 2021
High purity copper sputtering target material2021
Cu—Ga alloy sputtering target and method of manufacturing Cu—Ga alloy sputtering2020
Copper alloy sputtering target and manufacturing method of copper alloy sputteri2020
Alarm display system and alarm display method2020
Copper ingot, copper wire material, and method for producing copper ingot2020
Sputtering target for forming protective film, and laminated wiring film2020
Sputtering target for forming protective film and multilayer wiring film2019
Copper alloy sputtering target and manufacturing method of copper alloy sputteri2018