Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Post chemical mechanical polishing formulations and method of use

Post chemical mechanical polishing formulations and method of use

US Patent 10351809 · Granted Jul 16, 2019

Estimated economic value: $9,806,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Verification code processing method and apparatus, and device and storage medium2025
Post CMP cleaning composition2025
Formulations containing paraffinic oil and anti-settling agent2025
Protoporphyrin IX derivatives and use thereof to improve the health of plants2025
Natural indole auxin and aminopolycarboxylic acid herbicidal compositions2024
Post CMP cleaning compositions2024
Compositions and methods for post-CMP cleaning of cobalt substrates2023
Compositions and methods for post-CMP cleaning of cobalt substrates2023
Compositions and methods for post-CMP cleaning of cobalt substrates2023
Compositions and methods for post-CMP cleaning of cobalt substrates2023
Wet etching composition and method2023
Stable aqueous formulations of aflibercept2023