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Home › Patterned multi-beam nanoshift lithography for on-the-fly, high throughput production of customizable shape-designed microparticles, nanoparticles, and continuous films

Patterned multi-beam nanoshift lithography for on-the-fly, high throughput production of customizable shape-designed microparticles, nanoparticles, and continuous films

US Patent 10317799 · Granted Jun 11, 2019

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