Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mirror, in particular for a microlithographic projection exposure apparatus

Mirror, in particular for a microlithographic projection exposure apparatus

US Patent 10310382 · Granted Jun 4, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical component and optical system, in particular for microlithography2025
Method for treating a reflective optical element for the EUV wavelength range, m2022
Mirror element, in particular for a microlithographic projection exposure appara2020
Method and arrangement for determining the heating condition of a mirror in an o2018
Circular trimmer line2016
Square trimmer line2016
Hexagonal trimmer line2015
Trimmer head2015
Ink roller for a hand-held labelling device2013
Labeling machine2012
Labeling machine2010
Mechanisms for drawing a chain into or through a channel of a chain guide1992