Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Critical dimension uniformity monitoring for extreme ultra-violet reticles

Critical dimension uniformity monitoring for extreme ultra-violet reticles

US Patent 10288415 · Granted May 14, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sending time determination method and device, and indoor goniometric method and 2025
Query task execution method, apparatus, computer device and storage medium2025
Service control method based on service cluster, electronic device and storage m2025
Integration of an optical height sensor in mask inspection tools2025
Finding semiconductor defects using convolutional context attributes2025
Method of resource adjustment for service cluster, electronic device and storage2025
Hybrid data processing system and method2024
Rotating target for extreme ultraviolet source with liquid metal2024
Correcting aberration and apodization of an optical system using correction plat2024
Inspection of reticles using machine learning2024
Inspection of reticles using machine learning2024
Two-component solvent-less adhesive composition2024