Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › FinFET device and method of forming the same

FinFET device and method of forming the same

US Patent 10263096 · Granted Apr 16, 2019

Estimated economic value: $149,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

View dependent three-dimensional morphable models2025
Passivation for a vertical transfer gate in a pixel sensor2025
Deep trench isolation structure and methods for fabrication thereof2025
Full well capacity for image sensor2025
High electron mobility transistor and method for fabricating the same2025
High electron mobility transistor and method for fabricating the same2025
Photodiode structure for image sensor2025
Photodiode structure for image sensor2025
Metal-insulator-metal capacitor and methods of manufacturing2025
Photolithography alignment process for bonded wafers2025
High electron mobility transistor2025
High electron mobility transistor2025