Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical mechanical polishing pad and method for manufacturing the same

Chemical mechanical polishing pad and method for manufacturing the same

US Patent 10239183 · Granted Mar 26, 2019

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Light-mediated manipulation of droplets stabilized by fluorinated nanoparticles 2025
Gas curtain device for load port2025
Front opening unified pod2024
Ultra-stable aqueous foams containing highly hydrophobic particles and hydrophil2023
Termination circuit2022
Electric device and housing structure thereof2021
Load port assembly with gas curtain device, and purging method for substrate sto2021
Methods and compositions for treating non-small cell lung cancer2021
Shooting controller of paintball gun2020
Driver-assistance method and a driver-assistance apparatus2019
Method and apparatus for processing surrounding images of vehicle2018
Limiting hydrogen ion diffusion using multiple layers of SiO2 and Si3N42003