Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source

Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source

US Patent 10204767 · Granted Feb 12, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reflective mask blank for EUV lithography, reflective mask for EUV lithography, 2025
Far-infrared ray transmission member and method for manufacturing far-infrared r2025
Far-infrared ray transmission member and method for manufacturing far-infrared r2025
Reflective mask blank for EUV lithography and substrate with conductive film2025
Reflective mask blank for EUV lithography and substrate with conductive film2025
Reflective mask blank for EUV lithography, mask blank for EUV lithography, and m2025
Reflective mask blank and reflective mask2025
Reflective mask blank and reflective mask2024
Reflective mask blank for EUV lithography2024
Reflective mask blank for EUV lithography2024
Reflective mask blank, reflective mask, and method for manufacturing reflective 2024
Reflective mask blank for EUV lithography2024