Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Temperature control device for processing target object and method of selectively etching nitride film from multilayer film

Temperature control device for processing target object and method of selectively etching nitride film from multilayer film

US Patent 10192774 · Granted Jan 29, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Antenna for inductively coupled plasma excitation, antenna unit for inductively 2025
Plasma processing apparatus2025
Plasma processing apparatus2025
Plasma processing apparatus2025
Plasma processing apparatus and plasma processing method2025
Substrate processing method, substrate processing apparatus and substrate proces2025
Plasma processing apparatus, plasma state detection method, and plasma state det2024
Plasma processing apparatus2023
Plasma processing apparatus2023
Plasma processing apparatus2023
Plasma processing apparatus2023
Plasma processing apparatus2022