Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatus

Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatus

US Patent 10191390 · Granted Jan 29, 2019

Estimated economic value: $7,604,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for controlling a lithographic process2025
Methods and apparatus for obtaining diagnostic information relating to an indust2025
Methods and apparatus for obtaining diagnostic information relating to an indust2024
Methods of determining corrections for a patterning process, device manufacturin2023
Method for determining corrections for lithographic apparatus2023
Methods of alignment, overlay, configuration of marks, manufacturing of patterni2023
Inspection method and apparatus and lithographic processing cell2023
Methods of determining corrections for a patterning process, device manufacturin2023
Optimizing a sequence of processes for manufacturing of product units2022
Inspection method and apparatus and lithographic processing cell2022
Methods and apparatus for obtaining diagnostic information relating to an indust2022
Methods of determining corrections for a patterning process, device manufacturin2022