Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Composition for resist patterning and method for forming pattern using same

Composition for resist patterning and method for forming pattern using same

US Patent 10191380 · Granted Jan 29, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor aqueous composition and use of the same2024
Semiconductor aqueous composition and use of the same2024
Substrate cleaning solution, and using the same, method for manufacturing cleane2024
Rotor, motor, and rotor manufacturing method2024
Substrate processing method2024
Substrate pattern filling composition and use of the same2024
Fluorinated imide salt compound and surfactant2022
Gap filling composition and pattern forming method using composition containing 2022
Substrate processing method and substrate processing apparatus2022
Substrate processing method and substrate processing apparatus2021
Gap filling composition and pattern forming method using low molecular weight co2021
Lithography composition, a method for forming resist patterns and a method for m2021