Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and method for depositing a coating on a substrate at atmospheric pressure

Apparatus and method for depositing a coating on a substrate at atmospheric pressure

US Patent 10167556 · Granted Jan 1, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for metal and ceramic nanolayering for accident tolerant nu2025
Pulsed power module with pulse and ion flux control for magnetron sputtering2025
System for coupling RF power into LINACs and bellows coating by magnetron sputte2024
Low temperature chuck for plasma processing systems2024
Apparatus for generating etchants for remote plasma processes2024
Two piece electrode assembly with gap for plasma control2024
Methods and apparatus for symmetrical hollow cathode electrode and discharge mod2024
Low temperature chuck for plasma processing systems2023
Methods and apparatus for symmetrical hollow cathode electrode and discharge mod2022
Methods and apparatus for processing a substrate2022
Pulsed power module with pulse and ion flux control for magnetron sputtering2021
Compact system for coupling RF power directly into RF linacs2021