Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for forming a semiconductor device and a semiconductor device

Methods for forming a semiconductor device and a semiconductor device

US Patent 10096677 · Granted Oct 9, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of manufacturing a semiconductor device2025
Method of manufacturing a semiconductor device2025
Method of manufacturing a semiconductor device2025
Semiconductor device including a field stop region2025
Semiconductor device including a field stop region2025
Method of manufacturing a metal silicide layer above a silicon carbide substrate2025
Method of manufacturing a metal silicide layer above a silicon carbide substrate2025
Method of manufacturing a metal silicide layer above a silicon carbide substrate2025
Power semiconductor device having an electrode with an embedded material2025
Method of manufacturing ohmic contacts on a silicon carbide (SIC) substrate, met2025
Method of manufacturing ohmic contacts on a silicon carbide (SIC) substrate, met2025
Semiconductor device including a field stop region2025