Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Laser annealing systems and methods with ultra-short dwell times

Laser annealing systems and methods with ultra-short dwell times

US Patent 10083843 · Granted Sep 25, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High-efficiency line-forming optical systems and methods using a serrated spatia2022
Laser annealing systems and methods with ultra-short dwell times2020
Laser annealing systems and methods with ultra-short dwell times2020
Optimized agitator system for production of polyolefin2020
Laser-based systems and methods for melt-processing of metal layers in semicondu2020
Laser-based systems and methods for melt-processing of metal layers in semicondu2020
Controlling local fluid age in a stirred reactor2020
High-efficiency line-forming optical systems and methods using a serrated spatia2019
Method and apparatus for forming device quality gallium nitride layers on silico2019
Formation of heteroepitaxial layers with rapid thermal processing to remove latt2018
Method and apparatus for forming device quality gallium nitride layers on silico2018
Formation of heteroepitaxial layers with rapid thermal processing to remove latt2018